Magnetron sputtering is also a PVD process. Here, however, the material is not vaporized, but a so-called target (a solid plate of the desired coating material) is removed by high-energy particles. A plasma is generated in a vacuum chamber for this purpose. Positively charged argon ions from the plasma are strongly accelerated by an electric field at the target and collide with the target surface. This ion bombardment knocks atoms out of the target.
The magnetron considerably intensifies this process: strong magnetic fields are generated above the target, forcing the electrons in the plasma onto spiral paths. This keeps them close to the target for longer and leads to a higher ionization rate. The resulting denser plasma leads to a higher sputtering rate with lower energy consumption. The layers produced with magnetron sputtering are characterized by high density, homogeneity and excellent adhesion. They are often free of pores, evenly distributed over large areas and can be applied to complex geometries.
NEOVAC Expertise
NEOVAC has extensive expertise in the development and application of state-of-the-art sputtering technologies and is proficient in the full range of established industrial coating processes. From traditional planar magnetron systems to high-performance rotatable magnetron technologies, NEOVAC offers customized solutions for demanding industrial applications.
NEOVAC's many years of experience with various sputtering concepts enable the company to tailor processes specifically to the respective requirements regarding coating quality, material selection, productivity, and process stability.
A particular focus is on combining various power supply concepts, including DC, pulsed DC, and MF power supplies. Through the careful selection and combination of these technologies, sophisticated materials and coating systems can be deposited efficiently—with optimized process control, high reproducibility, and outstanding coating quality.
Mastery of these various sputtering technologies enables NEOVAC to respond flexibly to the requirements of a wide range of industries. Whether decorative coatings, functional layers, wear-resistant systems, or complex multilayer architectures—NEOVAC develops and validates processes designed for maximum performance and industrial scalability.
In particular, the integration of dual-rotatable magnetron systems represents a significant technological advancement. These systems enable higher material utilization, improved process stability, and efficient use of large target areas. In combination with modern pulsed DC and MF power technologies, they open up new possibilities for the deposition of sophisticated materials and the production of high-quality coatings with precisely controlled properties.
Thanks to a combination of in-depth process knowledge, extensive materials expertise, and practical experience with various sputtering platforms, NEOVAC is able to implement innovative coating solutions throughout the entire process chain. From technology selection and process development to industrial qualification, NEOVAC supports its customers with a holistic approach and the highest technical standards.
Milestone: Magnesium Sputtering
A key highlight is the successful qualification and implementation of rotatable magnetrons for magnesium targets, which represents a significant advance in process capability for industrial magnesium PVD applications.
Magnesium sputtering remains a demanding technical challenge due to its comparatively high vapor pressure and high chemical reactivity. Ensuring process stability, reliable target conditioning, and effective contamination control requires the highest level of technical precision as well as comprehensive expertise in materials. Furthermore, the safe handling of magnesium requires strict safety protocols that are consistently followed throughout the entire process chain.
The successful qualification of the magnesium sputtering module represents an important milestone for NEOVAC—a significant advance in the field of coating technology.